Photoresist: From Found Texture to Etched Copper
光敏抗蚀：从实物纹理到蚀刻铜版
标签：光敏抗蚀, UV曝光, 实物转印, 蚀刻
把实物纹理转为可无限复制的蚀刻版：叶片、蕾丝等母本以 600 dpi 高对比扫描，激光打印机在硫酸纸上输出正片；1 mm 铜板喷涂光敏抗蚀油墨（如 Positiv 20，60 ℃ 烘 15 min），与正片贴合进紫外曝光箱曝光 2–4 min，1% 碳酸钠显影 1–2 min。实物的光影深浅即转为蚀刻层次，三氯化铁 38°Bé、35 ℃ 蚀 10–15 min。此法让易损耗母本"一次采集、长期使用"。
Turn found textures into endlessly reproducible etched plates: scan leaves or lace at 600 dpi, print a positive onto vellum, spray the copper (1 mm) with photoresist ink (e.g. Positiv 20, bake 15 min at 60 °C), expose under UV 2–4 min and develop in 1% sodium carbonate. The object's light and shadow become etch depth; etch in 38°Bé FeCl3 at 35 °C for 10–15 min. Fragile masters get captured once and reused forever.
